Process Equipment : Physical Vapor Deposition

NEXUS PVD-HR System

Veeco's high-rate alumina NEXUS PVD-HR Physical Vapor Deposition System offers superior thickness uniformity and wafer-to-wafer repeatability without target poisoning.  The system provides the flexibility and process tune-ability of ion-assisted deposition with the high-rate and reliability requirements of thick overcoat applications.  The system is 200mm capable.  Designed to provide arc-free and pinhole-free films, the PVD-HR incorporates "best-in-class" technology on a small footprint for a lower cost of ownership.  As part of Veeco's NEXUS family, it can be integrated on a common hardware and software platform with complementary Veeco technologies, such as ion beam deposition, ion beam etch, atomic layer deposition and reactive sputtering.