Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Process Equipment : Ion Sources
Gridless Anode Layer Ion Sources
Veeco’s high power anode layer ion sources are scalable in either circular or linear geometries in excess of three meters and feature high current density operation from high vacuum up to milliTorr pressure ranges. The sources provide both gridless and filamentless operation with all inert and reactive gases. The sources' low maintenance, independent beam energy and current control make them excellent for processes requiring long, uninterrupted production runs. Round and linear anode layer sources are ideal for a wide variety of applications, such as architectural/ automotive glass, flat panel displays, web coating, ophthalmic, precision optics, data storage and semiconductor. Veeco offers the following Anode Layer Ion Sources: ALS40C; ALS340L; ALS1000L; ALS1500L; ALS2540L; and ALS3250L.
Linear Anode Layer Ion Source
High power gridless source with beam energies between 100 and 1800eV and beam currents up to 30mA/linear cm.
High power gridless source with beam energies between 100 and 1800eV and beam currents up to 30mA/linear cm.
ALS 340
The ALS source provides current densities and uniformities suitable for pre-cleaning, etching, surface modification, ion beam sputter deposition (IBD) and ion beam assisted deposition (IBAD).
The ALS source provides current densities and uniformities suitable for pre-cleaning, etching, surface modification, ion beam sputter deposition (IBD) and ion beam assisted deposition (IBAD).
ALS 1000
The ALS source provides current densities and uniformities suitable for pre-cleaning, etching, surface modification, ion beam sputter deposition (IBD) and ion beam assisted deposition (IBAD).
The ALS source provides current densities and uniformities suitable for pre-cleaning, etching, surface modification, ion beam sputter deposition (IBD) and ion beam assisted deposition (IBAD).
ALS 1500
The ALS source provides current densities and uniformities suitable for pre-cleaning, etching, surface modification, ion beam sputter deposition (IBD) and ion beam assisted deposition (IBAD).
The ALS source provides current densities and uniformities suitable for pre-cleaning, etching, surface modification, ion beam sputter deposition (IBD) and ion beam assisted deposition (IBAD).